1, the optical path system is different: DUV optical path mainly uses the refraction principle of light. Among them, the immersion lithography machine will fill deionized water between the projection lens and the wafer so that the light wave of 193nm is equivalent to134 nm; ; Dry mask aligner is not, and its medium is air. On the other hand, EUV mask aligner uses the principle of light reflection, and its interior must be operated in a vacuum. This is because the light source of EUV mask aligner is easily absorbed by the medium, and only vacuum can ensure that the energy of the light source is not lost to the greatest extent.
2. The luminous principle is different: DUV mask aligner light source is excimer laser, while EUV mask aligner is laser-excited plasma to emit EUV photons. Different ways, the light source is different. Among them, the wavelength of DUV mask aligner can reach 193 nm, while the wavelength of EUV light source is 13.5 nm. The difference between the two is very obvious. The shorter the wavelength, the higher the resolution can be achieved. This enables EUV mask aligner to undertake the production task of high-precision chips.
3. The manufacturing accuracy is different: the accuracy of DUV is also very different. DUV can only achieve 25 nm basically, while Intel achieved 10 nm by virtue of two-stage mode, but it could not reach below 10 nm. Only EUV can meet the wafer manufacturing requirements below 10nm, and can continue to extend to 5 nm and 3 nm.
Introduction of mask alignment process
Mask aligner, also known as mask alignment exposure machine, exposure system and lithography system, is the core equipment for manufacturing chips. It uses a technology similar to photo printing to print the fine patterns on the mask onto the silicon wafer through exposure.
The manufacturing of high-precision alignment system needs nearly perfect precision mechanical technology, which is also one of the technical difficulties that domestic mask aligner can't reach. Many American and German brands of mask aligner have special patented mechanical technology designs. Such as mycon &；; Q mask aligner adopts the patented technology of all-pneumatic bearing design, which effectively avoids the process error caused by mechanical friction of bearings.